Structural and magnetoresistance properties of Co/Cu multilayers

The structure and magnetoresistance of Co/Cu multilayers prepared by magnetron sputtering in a high vacuum deposition system have been investigated. It is shown that sputter-deposited Co/Cu multilayers can exhibit the giant magnetoresistive effect. The magnetoresistance depends on the microstructure...

Full description

Saved in:
Bibliographic Details
Published in:IEEE transactions on magnetics 1992-09, Vol.28 (5), p.2662-2664
Main Authors: Tomlinson, M.E., Pollard, R.J., Lord, D.G., Grundy, P.J., Chun, Z.
Format: Article
Language:English
Subjects:
Annealing
Buffer layers
Giant magnetoresistance
Glass
Magnetic multilayers
Magnetic properties
Microstructure
Size measurement
Sputtering
Vacuum systems
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The structure and magnetoresistance of Co/Cu multilayers prepared by magnetron sputtering in a high vacuum deposition system have been investigated. It is shown that sputter-deposited Co/Cu multilayers can exhibit the giant magnetoresistive effect. The magnetoresistance depends on the microstructure of the multilayer, and for structures grown on glass the presence of a suitable buffer layer can considerably increase the observed effect. Measurement on as-deposited and annealed multilayers show that a large effect is associated with smoother rather than rougher interfaces, at least in the scale of roughness in the present multilayers and with a small grain size.< >
ISSN:0018-9464
1941-0069
DOI:10.1109/20.179589