Process and characterization of nitrogenated carbon

Nitrogenated carbon films prepared in a DC-magnetron sputtering system were studied. Properties, including deposition rate, nitrogen content, nano-hardness, and thin film stress, were investigated as a function of deposition conditions, i.e. sputter power, substrate bias, substrate temperature, and...

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Bibliographic Details
Published in:IEEE transactions on magnetics 1997-09, Vol.33 (5), p.3145-3147
Main Authors: Yang, M.M., Chao, J.L., Russak, M.A.
Format: Article
Language:English
Subjects:
Nitrogen
Sputtering
Stress
Substrates
Temperature
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Summary:Nitrogenated carbon films prepared in a DC-magnetron sputtering system were studied. Properties, including deposition rate, nitrogen content, nano-hardness, and thin film stress, were investigated as a function of deposition conditions, i.e. sputter power, substrate bias, substrate temperature, and sputter pressure.
ISSN:0018-9464
1941-0069
DOI:10.1109/20.617872