Modeling an inductively coupled plasma reactor with chlorine chemistry

• Published in: IEEE transactions on plasma science 1996-02, Vol.24 (1), p.123-124
• Main Authors: Vitello, P., Bardsley, J.N., DiPeso, G., Parker, G.J.
• Format: Article
• Language: English
• Subjects: Coupling circuits; Etching; Exact sciences and technology; Inductors; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma production and heating; Plasma simulation; Plasma sources; Poisson equations; Steady-state
• ISSN: 0093-3813; 1939-9375
• DOI: 10.1109/27.491743

Inductively coupled plasma reactors are now one of the most important of the high-density plasma processing tools that have been developed in recent years. We present results from a two-dimensional (2-D) time-dependent fluid model of a chlorine plasma discharge. The steady-state values for the plasma potential, and the ion fluxes for Cl/sub 2//sup +/ and Cl/sup -/ are shown for a simulation of the Lawrence Livermore National Laboratory (LLNL) large area inductively coupled reactor experiment. The counter streaming of positive and negative ions is evident. The flux of Cl/sub 2//sup +/ is highly uniform over the lower surface of the reactor.