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A recessed-gap capacitive-gate GaAs CCD

A MESFET-compatible structure for GaAs capacitive-gate CCDs that eliminates the necessity for submicrometer interelectrode gaps and simplifies device fabrication is presented. This recessed-gap structure solves problems of low gate-channel-gate breakdown and large parasitic gate-to-gate capacitance...

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Bibliographic Details
Published in:IEEE electron device letters 1989-12, Vol.10 (12), p.525-527
Main Authors: Colbeth, R.E., Song, J.-I., Rossi, D.V., Fossum, E.R.
Format: Article
Language:English
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Summary:A MESFET-compatible structure for GaAs capacitive-gate CCDs that eliminates the necessity for submicrometer interelectrode gaps and simplifies device fabrication is presented. This recessed-gap structure solves problems of low gate-channel-gate breakdown and large parasitic gate-to-gate capacitance associated with ultrasmall gaps. Dark current is also reduced. Modeling and experimental results are reported.< >
ISSN:0741-3106
1558-0563
DOI:10.1109/55.43128