An efficient photoresist development simulator based on cellular automata with experimental verification

An efficient and practical photoresist development simulator based on cellular automata is presented. Image reversal and chemical amplification processes are also simulated using this simulator. To verify the simulator, a series of experiments have been designed and performed using the Shipley SNR-2...

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Bibliographic Details
Published in:IEEE transactions on semiconductor manufacturing 2000-02, Vol.13 (1), p.61-75
Main Authors: Karafyllidis, I., Hagouel, P.I., Thanailakis, A., Neureuther, A.R.
Format: Article
Language:English
Subjects:
Applied sciences
Chemical processes
Circuit simulation
Distribution functions
Electronics
Etching
Exact sciences and technology
Fabrication
Integrated circuit technology
Isolation technology
Lithography
Microelectronic fabrication (materials and surfaces technology)
Resists
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Testing
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Summary:An efficient and practical photoresist development simulator based on cellular automata is presented. Image reversal and chemical amplification processes are also simulated using this simulator. To verify the simulator, a series of experiments have been designed and performed using the Shipley SNR-248 negative resist, a stepper, and a deep ultraviolet source at 248 nm. Experiments were performed for periodic and isolated lines with pitches 300, 400, 500, and 1000 nm, for exposure energy doses of 11, 13, 17, and 23 mJ/cm/sup 2/, and with developer temperatures of 0, 20, and 80/spl deg/C. In all cases, the simulator results were found to be in very good agreement with the corresponding experimental results. The simulator has also successfully reproduced the incomplete opening effect observed in the case of close-spaced parallel lines.
ISSN:0894-6507
1558-2345
DOI:10.1109/66.827346