A process control methodology applied to manufacturing GaAs MMIC's

A methodology for guiding process-driven manufacturing organizations in instituting process control on a facility-wide basis is proposed. The methodology begins with defining a specific process and the customer's expectations of this process, then increases control over the process through four...

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Bibliographic Details
Published in:IEEE transactions on semiconductor manufacturing 1991-11, Vol.4 (4), p.304-311
Main Authors: Moran, P.W., Elliott, S.S., Wylie, N., Henderson, R.M., del Alamo, J.A.
Format: Article
Language:English
Subjects:
Application specific integrated circuits
Applied sciences
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
Gallium arsenide
Integrated circuit measurements
Lithography
Manufacturing processes
Microwave integrated circuits
Microwave theory and techniques
MMICs
Monolithic integrated circuits
Process control
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Summary:A methodology for guiding process-driven manufacturing organizations in instituting process control on a facility-wide basis is proposed. The methodology begins with defining a specific process and the customer's expectations of this process, then increases control over the process through four levels: measurable, predictable, acceptable, and recoverable. An application of this methodology to the control of submicron-gate lithography on a GaAs monolithic microwave integrated circuit (MMIC) process is discussed. Experience suggests that the realization of process control is as much a managerial problem as it is a technical one. This application suggests that the proposed methodology serves as a useful conceptual guideline for operators, engineers, and managers in uniformly applying a wide variety of process control tools.< >
ISSN:0894-6507
1558-2345
DOI:10.1109/66.97814