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High Bandwidth Capacitance Efficient Silicon MOS Modulator
This article analysed and optimised horizontal Silicon insulator Silicon capacitor (H-SISCAP) phase shifter structures with insulator thickness t ox up to 40 nm. The phase shifter has an effective capacitance ( C eff ) around 0.5 fF/μm and a phase change efficiency 1.8 V ·cm, of which the balance be...
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Published in: | Journal of lightwave technology 2021-01, Vol.39 (1), p.201-207 |
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Main Authors: | , , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | This article analysed and optimised horizontal Silicon insulator Silicon capacitor (H-SISCAP) phase shifter structures with insulator thickness t ox up to 40 nm. The phase shifter has an effective capacitance ( C eff ) around 0.5 fF/μm and a phase change efficiency 1.8 V ·cm, of which the balance between capacitance and phase efficiency is comparable with silicon rib waveguide based depletion type phase shifters. Silicon Mach-Zehnder interferometer (MZI) modulators with 200 μm long H-SISCAP phase shifters optimised for TM polarised light have been fabricated and demonstrated with a 3 dB EO bandwidth above 35 GHz and intrinsic H-SISCAP RC bandwidth around 150 GHz. The modulator displays open eye-diagrams for data rates up to 60 Gbit/s without detection equalization and 72 Gbit/s with 2 taps equalization in NRZ-OOK operation. The demonstrated H-SISCAP phase shifter paves the way to build high bandwidth segmented, travelling wave and compact ring resonators modulators for applications of optical transmitters, microwave generations, and LIDAR applications, etc. |
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ISSN: | 0733-8724 1558-2213 |
DOI: | 10.1109/JLT.2020.3026945 |