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Temperature-Dependent Thermal Resistance of GaN-on-Diamond HEMT Wafers

The thermal properties of GaN-on-diamond high-electron mobility transistor (HEMT) wafers from 25 °C to 250 °C are reported. The effective thermal boundary resistance between GaN and diamond decreases at elevated temperatures due to the increasing thermal conductivity of the amorphous SiNx interlayer...

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Published in:IEEE electron device letters 2016-05, Vol.37 (5), p.621-624
Main Authors: Huarui Sun, Pomeroy, James W., Simon, Roland B., Francis, Daniel, Faili, Firooz, Twitchen, Daniel J., Kuball, Martin
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description The thermal properties of GaN-on-diamond high-electron mobility transistor (HEMT) wafers from 25 °C to 250 °C are reported. The effective thermal boundary resistance between GaN and diamond decreases at elevated temperatures due to the increasing thermal conductivity of the amorphous SiNx interlayer, therefore potentially counteracting thermal runaway of devices. The results demonstrate the thermal benefit of GaN-on-diamond for HEMT high-power operations, and provide valuable information for assessing the thermal resistance and reliability of devices.
doi_str_mv 10.1109/LED.2016.2537835
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source IEEE Electronic Library (IEL) Journals
subjects Conductivity
Diamonds
Gallium nitride
GaN-on-diamond
HEMT
reliability
temperature dependence
Temperature measurement
Thermal conductivity
Thermal resistance
title Temperature-Dependent Thermal Resistance of GaN-on-Diamond HEMT Wafers
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