Thermal Stability and Sn Segregation of Low-Resistance Ti/p + -Ge 0.95 Sn 0.05 Contact

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Bibliographic Details
Published in:IEEE electron device letters 2019-10, Vol.40 (10), p.1575-1578
Main Authors: Wu, Ying, Xu, Haiwen, Han, Kaizhen, Gong, Xiao
Format: Article
Language:English
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ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2019.2933007