Chip-level waveguide-mirror-pillar optical interconnect structure

Waveguides, mirrors, and polymer pillars can be integrated together to provide optical interconnects to the chip level. Total internal reflection in the polymer pillar provides a high level of spatial confinement of the light. The metallized mirror terminating the waveguide may be at 45deg or at a n...

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Bibliographic Details
Published in:IEEE photonics technology letters 2006-08, Vol.18 (15), p.1672-1674
Main Authors: Ogunsola, O.O., Thacker, H.D., Bachim, B.L., Bakir, M.S., Pikarsky, J., Gaylord, T.K., Meindl, J.D.
Format: Article
Language:English
Subjects:
Anisotropic magnetoresistance
Etching
Finite-difference time-domain (FDTD)
Joining
Metallization
Mirrors
Noise levels
Optical device fabrication
Optical interconnections
Optical interconnects
Optical polymers
Optical reflection
Optical waveguides
Pillars
polymer pillars
Reflection
Silicon
Simulation
Stopping
Waveguides
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Summary:Waveguides, mirrors, and polymer pillars can be integrated together to provide optical interconnects to the chip level. Total internal reflection in the polymer pillar provides a high level of spatial confinement of the light. The metallized mirror terminating the waveguide may be at 45deg or at a nearby angle such as 54.74deg (anisotropically etched silicon) and produce nearly equal coupling efficiencies. For a polymer waveguide, a gold mirror, and a polymer pillar of the dimensions fabricated, the simulated coupling efficiencies are 80.7% or 0.93 dB (45deg mirror) and 82.5% or 0.84 dB (54.74deg mirror), respectively. These simulations together with the fabrication and testing of a 54.74deg mirror configuration demonstrates the viability of the waveguide-mirror-pillar structure, its insensitivity to mirror angle, and its compatibility with current substrate fabrication technologies
ISSN:1041-1135
1941-0174
DOI:10.1109/LPT.2006.879533