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Al/AlOx/Al Josephson Junctions Fabricated by Shadow Evaporation Employing Multiple Symmetric Angled Depositions Per Channel
A modification to the Manhattan shadow method for metal deposition was studied in the fabrication of Josephson Junctions (JJs). To highlight the need for the modified Manhattan shadow method, fabrication without and with the modification was performed and analyzed. Without the modification to the sh...
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Published in: | IEEE transactions on applied superconductivity 2023-08, Vol.33 (5), p.1-5 |
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description | A modification to the Manhattan shadow method for metal deposition was studied in the fabrication of Josephson Junctions (JJs). To highlight the need for the modified Manhattan shadow method, fabrication without and with the modification was performed and analyzed. Without the modification to the shadow method, disconnects in the JJ top electrode caused by shadowing from the bottom electrode were observed. Employing an additional Al deposition (at 180^{\circ } rotation) in the initial shadow deposition produced functional JJs with enhanced uniformity of top electrode coverage. Analysis comparing the deposition method without and with the modification is provided through scanning electron microscopy (SEM), atomic force microscopy (AFM), and JJ IV characterizations at temperatures as low as 10 mK. |
doi_str_mv | 10.1109/TASC.2023.3246940 |
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To highlight the need for the modified Manhattan shadow method, fabrication without and with the modification was performed and analyzed. Without the modification to the shadow method, disconnects in the JJ top electrode caused by shadowing from the bottom electrode were observed. Employing an additional Al deposition (at 180<inline-formula><tex-math notation="LaTeX">^{\circ }</tex-math></inline-formula> rotation) in the initial shadow deposition produced functional JJs with enhanced uniformity of top electrode coverage. Analysis comparing the deposition method without and with the modification is provided through scanning electron microscopy (SEM), atomic force microscopy (AFM), and JJ IV characterizations at temperatures as low as 10 mK.</description><identifier>ISSN: 1051-8223</identifier><identifier>EISSN: 1558-2515</identifier><identifier>DOI: 10.1109/TASC.2023.3246940</identifier><identifier>CODEN: ITASE9</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Deposition ; Electrodes ; Fabrication ; Josephson junction ; Josephson junctions ; Junctions ; Metals ; Microscopy ; quantum circuits ; Resists ; Shadow mapping ; Shadows ; SQUID ; Substrates ; superconductor</subject><ispartof>IEEE transactions on applied superconductivity, 2023-08, Vol.33 (5), p.1-5</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2023</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c246t-b9d57860638b1c3015716e3c98adbc4e898a498ddbbf780358a0035e4a96c51d3</cites><orcidid>0000-0002-8635-6790 ; 0000-0002-2576-4774 ; 0000-0003-4465-7824 ; 0000-0002-3476-563X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10049540$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids></links><search><creatorcontrib>Bankson, Stephen M.</creatorcontrib><creatorcontrib>Tillman, Chase C.</creatorcontrib><creatorcontrib>Sellers, John A.</creatorcontrib><creatorcontrib>Hamilton, Michael C.</creatorcontrib><title>Al/AlOx/Al Josephson Junctions Fabricated by Shadow Evaporation Employing Multiple Symmetric Angled Depositions Per Channel</title><title>IEEE transactions on applied superconductivity</title><addtitle>TASC</addtitle><description>A modification to the Manhattan shadow method for metal deposition was studied in the fabrication of Josephson Junctions (JJs). To highlight the need for the modified Manhattan shadow method, fabrication without and with the modification was performed and analyzed. Without the modification to the shadow method, disconnects in the JJ top electrode caused by shadowing from the bottom electrode were observed. Employing an additional Al deposition (at 180<inline-formula><tex-math notation="LaTeX">^{\circ }</tex-math></inline-formula> rotation) in the initial shadow deposition produced functional JJs with enhanced uniformity of top electrode coverage. Analysis comparing the deposition method without and with the modification is provided through scanning electron microscopy (SEM), atomic force microscopy (AFM), and JJ IV characterizations at temperatures as low as 10 mK.</description><subject>Deposition</subject><subject>Electrodes</subject><subject>Fabrication</subject><subject>Josephson junction</subject><subject>Josephson junctions</subject><subject>Junctions</subject><subject>Metals</subject><subject>Microscopy</subject><subject>quantum circuits</subject><subject>Resists</subject><subject>Shadow mapping</subject><subject>Shadows</subject><subject>SQUID</subject><subject>Substrates</subject><subject>superconductor</subject><issn>1051-8223</issn><issn>1558-2515</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNpNkNFLwzAQxosoOKd_gOBDwOduSdN0yWOpmzomEzafS5reto62qUmrFv95U7YHX747uO93x32ed0_whBAsptt4k0wCHNAJDcJIhPjCGxHGuB8wwi5djxnxeRDQa-_G2iPGJOQhG3m_cTmNy_WPE7TUFpqD1TVadrVqC11btJCZKZRsIUdZjzYHmetvNP-SjTZycKB51ZS6L-o9euvKtmhKQJu-qqB1GIrrfenIJ2i0LU4L38Gg5CDrGspb72onSwt35zr2PhbzbfLir9bPr0m88pV7pfUzkbMZj3BEeUYUxYTNSARUCS7zTIXAXRMKnudZtptxTBmX2CmEUkSKkZyOvcfT3sbozw5smx51Z2p3Mg0cIDiPiHAucnIpo601sEsbU1TS9CnB6ZBxOmScDhmn54wd83BiCgD458ehYG78B1ejePI</recordid><startdate>20230801</startdate><enddate>20230801</enddate><creator>Bankson, Stephen M.</creator><creator>Tillman, Chase C.</creator><creator>Sellers, John A.</creator><creator>Hamilton, Michael C.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-8635-6790</orcidid><orcidid>https://orcid.org/0000-0002-2576-4774</orcidid><orcidid>https://orcid.org/0000-0003-4465-7824</orcidid><orcidid>https://orcid.org/0000-0002-3476-563X</orcidid></search><sort><creationdate>20230801</creationdate><title>Al/AlOx/Al Josephson Junctions Fabricated by Shadow Evaporation Employing Multiple Symmetric Angled Depositions Per Channel</title><author>Bankson, Stephen M. ; Tillman, Chase C. ; Sellers, John A. ; Hamilton, Michael C.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c246t-b9d57860638b1c3015716e3c98adbc4e898a498ddbbf780358a0035e4a96c51d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Deposition</topic><topic>Electrodes</topic><topic>Fabrication</topic><topic>Josephson junction</topic><topic>Josephson junctions</topic><topic>Junctions</topic><topic>Metals</topic><topic>Microscopy</topic><topic>quantum circuits</topic><topic>Resists</topic><topic>Shadow mapping</topic><topic>Shadows</topic><topic>SQUID</topic><topic>Substrates</topic><topic>superconductor</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Bankson, Stephen M.</creatorcontrib><creatorcontrib>Tillman, Chase C.</creatorcontrib><creatorcontrib>Sellers, John A.</creatorcontrib><creatorcontrib>Hamilton, Michael C.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) Online</collection><collection>IEEE Xplore</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on applied superconductivity</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Bankson, Stephen M.</au><au>Tillman, Chase C.</au><au>Sellers, John A.</au><au>Hamilton, Michael C.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Al/AlOx/Al Josephson Junctions Fabricated by Shadow Evaporation Employing Multiple Symmetric Angled Depositions Per Channel</atitle><jtitle>IEEE transactions on applied superconductivity</jtitle><stitle>TASC</stitle><date>2023-08-01</date><risdate>2023</risdate><volume>33</volume><issue>5</issue><spage>1</spage><epage>5</epage><pages>1-5</pages><issn>1051-8223</issn><eissn>1558-2515</eissn><coden>ITASE9</coden><abstract>A modification to the Manhattan shadow method for metal deposition was studied in the fabrication of Josephson Junctions (JJs). To highlight the need for the modified Manhattan shadow method, fabrication without and with the modification was performed and analyzed. Without the modification to the shadow method, disconnects in the JJ top electrode caused by shadowing from the bottom electrode were observed. Employing an additional Al deposition (at 180<inline-formula><tex-math notation="LaTeX">^{\circ }</tex-math></inline-formula> rotation) in the initial shadow deposition produced functional JJs with enhanced uniformity of top electrode coverage. Analysis comparing the deposition method without and with the modification is provided through scanning electron microscopy (SEM), atomic force microscopy (AFM), and JJ IV characterizations at temperatures as low as 10 mK.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TASC.2023.3246940</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0002-8635-6790</orcidid><orcidid>https://orcid.org/0000-0002-2576-4774</orcidid><orcidid>https://orcid.org/0000-0003-4465-7824</orcidid><orcidid>https://orcid.org/0000-0002-3476-563X</orcidid></addata></record> |
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subjects | Deposition Electrodes Fabrication Josephson junction Josephson junctions Junctions Metals Microscopy quantum circuits Resists Shadow mapping Shadows SQUID Substrates superconductor |
title | Al/AlOx/Al Josephson Junctions Fabricated by Shadow Evaporation Employing Multiple Symmetric Angled Depositions Per Channel |
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