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Radiation Effects on Silicon Charge-Coupled Devices
The permanent ionizing and neutron radiation-induced degradation in silicon charge-coupled devices, (CCD's), along with transient upset effects, are reviewed. The operation of a threshold voltage insensitive CCD input technique in a total dose radiation environment is evaluated. CCD structural...
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Published in: | IEEE transactions on components, hybrids, and manufacturing technology hybrids, and manufacturing technology, 1978-12, Vol.1 (4), p.353-365 |
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cites | cdi_FETCH-LOGICAL-c375t-509ae4b075bcdae2b30f66bacef64073cc6320098d71cceca634d11b6b2af1a93 |
container_end_page | 365 |
container_issue | 4 |
container_start_page | 353 |
container_title | IEEE transactions on components, hybrids, and manufacturing technology |
container_volume | 1 |
creator | Killiany, J. |
description | The permanent ionizing and neutron radiation-induced degradation in silicon charge-coupled devices, (CCD's), along with transient upset effects, are reviewed. The operation of a threshold voltage insensitive CCD input technique in a total dose radiation environment is evaluated. CCD structural design rules for decreasing ionizing radiation sensitivity are presented. The increased total ionizing dose tolerance of CCD's fabricated with a radiation hard oxide is described. Liquid nitrogen temperature irradiation effects in CCD's are discussed. |
doi_str_mv | 10.1109/TCHMT.1978.1135311 |
format | article |
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The operation of a threshold voltage insensitive CCD input technique in a total dose radiation environment is evaluated. CCD structural design rules for decreasing ionizing radiation sensitivity are presented. The increased total ionizing dose tolerance of CCD's fabricated with a radiation hard oxide is described. Liquid nitrogen temperature irradiation effects in CCD's are discussed.</description><subject>Charge coupled devices</subject><subject>Degradation</subject><subject>Insulation</subject><subject>Interface states</subject><subject>Ionization</subject><subject>Ionizing radiation</subject><subject>Nitrogen</subject><subject>Potential well</subject><subject>Radiation effects</subject><subject>Silicon</subject><issn>0148-6411</issn><issn>1558-3082</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1978</creationdate><recordtype>article</recordtype><recordid>eNpFj91KxDAQRoMoWFdfQG_6AllnkjZtLqWuP7Ai6HodknSikWqXpgq-vV234NU3w8cZ5jB2jrBEBH25ae4eNkvUVT3tspSIByzDsqy5hFocsgywqLkqEI_ZSUrvAEJoBRmTT7aNdoz9Z74KgfyY8ml8jl30UzZvdngl3vRf247a_Jq-o6d0yo6C7RKdzblgLzer6QO-fry9b67W3MuqHHkJ2lLhoCqdby0JJyEo5aynoAqopPdKCgBdtxV6T94qWbSITjlhA1otF0zs7_qhT2mgYLZD_LDDj0EwO23zp2122mbWnqCLPRSJ6B-Y21_Ab1PL</recordid><startdate>197812</startdate><enddate>197812</enddate><creator>Killiany, J.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>197812</creationdate><title>Radiation Effects on Silicon Charge-Coupled Devices</title><author>Killiany, J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c375t-509ae4b075bcdae2b30f66bacef64073cc6320098d71cceca634d11b6b2af1a93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1978</creationdate><topic>Charge coupled devices</topic><topic>Degradation</topic><topic>Insulation</topic><topic>Interface states</topic><topic>Ionization</topic><topic>Ionizing radiation</topic><topic>Nitrogen</topic><topic>Potential well</topic><topic>Radiation effects</topic><topic>Silicon</topic><toplevel>online_resources</toplevel><creatorcontrib>Killiany, J.</creatorcontrib><collection>CrossRef</collection><jtitle>IEEE transactions on components, hybrids, and manufacturing technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Killiany, J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Radiation Effects on Silicon Charge-Coupled Devices</atitle><jtitle>IEEE transactions on components, hybrids, and manufacturing technology</jtitle><stitle>T-CHMT</stitle><date>1978-12</date><risdate>1978</risdate><volume>1</volume><issue>4</issue><spage>353</spage><epage>365</epage><pages>353-365</pages><issn>0148-6411</issn><eissn>1558-3082</eissn><coden>ITTEDR</coden><abstract>The permanent ionizing and neutron radiation-induced degradation in silicon charge-coupled devices, (CCD's), along with transient upset effects, are reviewed. The operation of a threshold voltage insensitive CCD input technique in a total dose radiation environment is evaluated. CCD structural design rules for decreasing ionizing radiation sensitivity are presented. The increased total ionizing dose tolerance of CCD's fabricated with a radiation hard oxide is described. Liquid nitrogen temperature irradiation effects in CCD's are discussed.</abstract><pub>IEEE</pub><doi>10.1109/TCHMT.1978.1135311</doi><tpages>13</tpages><oa>free_for_read</oa></addata></record> |
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identifier | ISSN: 0148-6411 |
ispartof | IEEE transactions on components, hybrids, and manufacturing technology, 1978-12, Vol.1 (4), p.353-365 |
issn | 0148-6411 1558-3082 |
language | eng |
recordid | cdi_crossref_primary_10_1109_TCHMT_1978_1135311 |
source | IEEE Electronic Library (IEL) Journals |
subjects | Charge coupled devices Degradation Insulation Interface states Ionization Ionizing radiation Nitrogen Potential well Radiation effects Silicon |
title | Radiation Effects on Silicon Charge-Coupled Devices |
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