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Effect of doped substrate on GaAs-AlGaAs interfacial workfunction IR detector response through cavity effect

In this paper, results are reported showing response enhancement in GaAs-AlGaAs IR detectors using a doped substrate to increase reflection, enhancing the resonant cavity effect. Responsivity for heterojunction interfacial workfunction detectors grown on semi-insulating (SI) and doped substrates are...

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Bibliographic Details
Published in:IEEE transactions on electron devices 2005-03, Vol.52 (3), p.413-418
Main Authors: Matsik, S.G., Rinzan, M.B.M., Esaev, D.G., Perera, A.G.U., von Winckel, G., Stintz, A., Krishna, S., Liu, H.C., Byloos, M.D., Oogarah, T., Sproule, G.I., Liu, K., Buchanan, M.
Format: Article
Language:English
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Summary:In this paper, results are reported showing response enhancement in GaAs-AlGaAs IR detectors using a doped substrate to increase reflection, enhancing the resonant cavity effect. Responsivity for heterojunction interfacial workfunction detectors grown on semi-insulating (SI) and doped substrates are compared. For a device grown on an SI substrate, a 9-/spl mu/m resonance peak had a response of 1.5 mA/W while a similar device on an n-doped substrate showed 12 mA/W. Also, the difference between response under forward and reverse bias (3 versus 12 mA/W) for the sample grown on the doped substrate, as well as calculated results confirm that the increased response is due to the resonant enhancement. An optimized design for a 15-/spl mu/m peak (24 /spl mu/m 0 response threshold) detector grown on a doped substrate could expect a peak response of 4 A/W with a 50% quantum efficiency and D/sup */ /spl sim/ 2 /spl times/ 10/sup 10/ Jones at the background limited temperature of 50 K.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2005.843876