Loading…

Effect of Hydrogen on Defects of AlGaN/GaN HEMTs Characterized by Low-Frequency Noise

The effect of hydrogen on defects in AlGaN/GaN high-electron-mobility transistors (HEMTs) was investigated by using low-frequency noise (LFN) method. The results show that drain-to-source current of AlGaN/GaN HEMTs after hydrogen treatment is significantly larger than that of the fresh AlGaN/GaN HEM...

Full description

Saved in:
Bibliographic Details
Published in:IEEE transactions on electron devices 2018-04, Vol.65 (4), p.1321-1326
Main Authors: Chen, Y. Q., Zhang, Y. C., Liu, Y., Liao, X. Y., En, Y. F., Fang, W. X., Huang, Y.
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The effect of hydrogen on defects in AlGaN/GaN high-electron-mobility transistors (HEMTs) was investigated by using low-frequency noise (LFN) method. The results show that drain-to-source current of AlGaN/GaN HEMTs after hydrogen treatment is significantly larger than that of the fresh AlGaN/GaN HEMTs. The maximum variation of drain-to-source current is up to 80 mA at the gate-to-source voltage of 0 V and drain-to-source voltage of 5 V. The suppression of current collapse was also observed, and the gate-lag characteristic becomes better for the AlGaN/GaN HEMTs after hydrogen treatment. Extracted by the LFN method, the trap density decreases by about one order of magnitude in the AlGaN/GaN HEMTs after hydrogen treatment, and this would lead to less depleted electrons in the channel 2-D electron gas. The mechanism for the reduction of trap density could be attributed to H-passivated defects at AlGaN surface, AlGaN barrier layer, and heterostructure interface. The results of this paper may be useful in the design and application of AlGaN/GaN HEMTs.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2018.2803443