Ab Initio Study of HfO 2 /Ti Interface V O /O i Frenkel Pair Formation Barrier and V O Interaction With Filament

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Bibliographic Details
Published in:IEEE transactions on electron devices 2022-09, Vol.69 (9), p.5130-5137
Main Author: Wong, Hiu Yung
Format: Article
Language:English
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ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2022.3188227