Nanoscale Magnification and Shape Control System for Precision Overlay in Jet and Flash Imprint Lithography

Jet and flash imprint lithography steppers have demonstrated unprecedented capability for patterning of sub-25-nm features for semiconductor manufacturing. A critical requirement for such patterning is the ability to overlay one layer of a device to a previously printed layer. In this paper, the des...

Full description

Saved in:
Bibliographic Details
Published in:IEEE/ASME transactions on mechatronics 2015-02, Vol.20 (1), p.122-132
Main Authors: Cherala, Anshuman, Schumaker, Philip, Mokaberi, Babak, Selinidis, Kosta, Choi, Byung Jin, Meissl, Mario J., Khusnatdinov, Niyaz N., LaBrake, Dwayne, Sreenivasan, S. V.
Format: Article
Language:English
Subjects:
Actuators
Distortion
Force
In-liquid alignment and overlay systems
jet and flash imprint lithography (J-FIL)
Joints
Liquids
Lithography
Metrology
Nanostructure
Patterning
Photolithography
precision magnification and shape control systems
Resists
Semiconductors
Shape control
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Jet and flash imprint lithography steppers have demonstrated unprecedented capability for patterning of sub-25-nm features for semiconductor manufacturing. A critical requirement for such patterning is the ability to overlay one layer of a device to a previously printed layer. In this paper, the design and development of a nanoprecision mask magnification/shape control system (MSCS) for the unique requirements of imprint-based overlay is presented. Imprint specific topics such as in-liquid overlay and distortions, and on-tool overlay metrology are discussed. The MSCS presented here has demonstrated 10-nm mix and match overlay (mean + 3 sigma) capability that approaches performance of state-of-the-art photolithography tools.
ISSN:1083-4435
1941-014X
DOI:10.1109/TMECH.2013.2297679