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Push-Pull Class \Phi } RF Power Amplifier
The Class \Phi _\text{2}/EF_{\text{2}} amplifier is an attractive topology for high-voltage and high-frequency power conversion because of the high efficiency, reduced device voltage stress, simplicity of gate driving, and load-independent ZVS operation. Due to many degrees of freedom for tuning, pr...
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Published in: | IEEE transactions on power electronics 2020-10, Vol.35 (10), p.10515-10531 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The Class \Phi _\text{2}/EF_{\text{2}} amplifier is an attractive topology for high-voltage and high-frequency power conversion because of the high efficiency, reduced device voltage stress, simplicity of gate driving, and load-independent ZVS operation. Due to many degrees of freedom for tuning, previous studies can only solve the single-ended \Phi _\text{2} circuit using numerical methods. This work focuses on improving the design and operating characteristics of a push-pull \Phi _\text{2} amplifier with a T network connected between the switch nodes, or a PPT \Phi _\text{2} amplifier. The PPT \Phi _\text{2} amplifier has less circulating energy and achieves higher cutoff frequency f_{T} than other \Phi _\text{2}/EF_{2} circuits. We, then, present a series-stacked input configuration to reduce the switch voltage stress and improve the efficiency and power density. A compact 6.78-MHz, 100-V, 300-W prototype converter is demonstrated that uses low-cost Si devices and achieves 96% peak total efficiency and maintains above 94.5% drain efficiency across a wide range of voltage and power. Together with the advances in wide-bandgap semiconductors and magnetic materials, the PPT \Phi _\text{2} circuit opens more possibilities for the state-of-the-art performance of solid-state RF amplifiers in high-frequency, high-power applications, including wireless charging for electric vehicles, plasma RF drives, and nuclear magnetic resonance spectroscopy. |
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ISSN: | 0885-8993 1941-0107 |
DOI: | 10.1109/TPEL.2020.2981312 |