Modeling of Resonant Surface Wave Excitation in a Large CCP Reactor

Low-pressure plasmas produced in capacitively coupled plasma (CCP) reactors are used extensively in the plasma processing industry. Although the physics of small scale CCP reactors operated under low pressure is fairly well understood, larger scale CCP reactors constructed to meet the industrial nee...

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Bibliographic Details
Published in:IEEE transactions on plasma science 2017-04, Vol.45 (4), p.527-534
Main Author: Eremin, Denis
Format: Article
Language:English
Subjects:
Approximation
Collisional plasmas
Damping
Discharges (electric)
Electrodes
Glow discharges
Inductors
Industrial applications
Low pressure
Plasma
Plasma density
plasma materials processing
Plasma processing
plasma simulation
Plasmas (physics)
Processing industry
Reactors
Surface treatment
Surface waves
Wave excitation
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Summary:Low-pressure plasmas produced in capacitively coupled plasma (CCP) reactors are used extensively in the plasma processing industry. Although the physics of small scale CCP reactors operated under low pressure is fairly well understood, larger scale CCP reactors constructed to meet the industrial needs often exhibit surprising behavior in experiments, which affects discharge parameters of importance to the industrial applications. This can be explained by the resonant excitation of surface modes that a CCP reactor can support. Limitations of the drift-diffusion approximation in description of the surface mode phenomena in low-pressure plasmas are discussed. It is shown that a particular class of the surface modes can be adequately modeled using the electrostatic approximation if the finite electron inertia is taken into account. Continuing a previous work [1], the present study demonstrates how such modes are triggered and how they affect the radial plasma density profile uniformity. This is done by using a self-consistent 2d3v electrostatic implicit PIC/MCC code. It is shown that in highly collisional plasmas, the nonuniformities caused by the modes disappear due to the large mode damping.
ISSN:0093-3813
1939-9375
DOI:10.1109/TPS.2017.2673781