Structural and optical properties of titanium aluminum nitride films ( Ti 1−x Al x N )

Titanium aluminum nitride films ( Ti 1−x Al x N ) have been deposited by reactive magnetron cosputtering. Elemental compositions of these films have been determined by core level photoelectron spectroscopy. Scanning electron microscopy reveals a columnar film growth. This is also reflected by the to...

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2001-05, Vol.19 (3), p.922-929
Main Authors: Schüler, Andreas, Thommen, Verena, Reimann, Peter, Oelhafen, Peter, Francz, Gilbert, Zehnder, Thomas, Düggelin, Marcel, Mathys, Daniel, Guggenheim, Richard
Format: Article
Language:English
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Summary:Titanium aluminum nitride films ( Ti 1−x Al x N ) have been deposited by reactive magnetron cosputtering. Elemental compositions of these films have been determined by core level photoelectron spectroscopy. Scanning electron microscopy reveals a columnar film growth. This is also reflected by the topography of film surfaces as studied by atomic force microscopy. By x-ray diffraction a crystalline atomic structure is revealed. Single phase samples can be obtained, consisting of the substitutional solid solution (Ti, Al)N. Crystallites show preferential orientation. The optical properties of these films have been investigated by spectrophotometry in the UV-VIS-NIR wavelength range. Depending on the elemental composition, the optical constants vary from metallic to dielectric behavior. For film compositions with x
ISSN:0734-2101
1520-8559
DOI:10.1116/1.1359532