Field electron emission from patterned nanostructured carbon films on sodalime glass substrates

Using the hot filament chemical vapor deposition method, patterned nanostructured carbon films with excellent field emission characteristics have been deposited at the nominal substrate temperatures of 540 °C and 450°C on sodalime glass substrates. These films have demonstrated a good visual emissio...

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Bibliographic Details
Published in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2001-05, Vol.19 (3), p.946-949
Main Authors: Park, Kyung Ho, Lee, Kyung Moon, Choi, Seungho, Lee, Soonil, Koh, Ken Ha
Format: Article
Language:English
Subjects:
Carbon
Catalyst activity
Chemical vapor deposition
Electrochemical electrodes
Electron emission
Field emission displays
Nanostructured materials
Photolithography
Semiconducting glass
Substrates
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Summary:Using the hot filament chemical vapor deposition method, patterned nanostructured carbon films with excellent field emission characteristics have been deposited at the nominal substrate temperatures of 540 °C and 450°C on sodalime glass substrates. These films have demonstrated a good visual emission uniformity and good current stability during the continuous operation for 140 h. Taking advantage of the poor adhesion of the nanostructure carbon without a chrome interlayer and selective growth on the metal catalyst, the formation of the patterned nanostructured carbon films has been carried out via the prepattering of the chrome electrodes and/or metal catalyst using the conventional photolithography process. An example of the patterned emitter with high complexity is presented to demonstrate the feasibility of practical emitter fabrication using nanostructured carbon films.
ISSN:0734-211X
1071-1023
1520-8567
DOI:10.1116/1.1373641