Field electron emission from patterned nanostructured carbon films on sodalime glass substrates

• Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2001-05, Vol.19 (3), p.946-949
• Main Authors: Park, Kyung Ho, Lee, Kyung Moon, Choi, Seungho, Lee, Soonil, Koh, Ken Ha
• Format: Article
• Language: English
• Subjects: Carbon; Catalyst activity; Chemical vapor deposition; Electrochemical electrodes; Electron emission; Field emission displays; Nanostructured materials; Photolithography; Semiconducting glass; Substrates
• ISSN: 0734-211X; 1071-1023; 1520-8567
• DOI: 10.1116/1.1373641

Using the hot filament chemical vapor deposition method, patterned nanostructured carbon films with excellent field emission characteristics have been deposited at the nominal substrate temperatures of 540 °C and 450°C on sodalime glass substrates. These films have demonstrated a good visual emission uniformity and good current stability during the continuous operation for 140 h. Taking advantage of the poor adhesion of the nanostructure carbon without a chrome interlayer and selective growth on the metal catalyst, the formation of the patterned nanostructured carbon films has been carried out via the prepattering of the chrome electrodes and/or metal catalyst using the conventional photolithography process. An example of the patterned emitter with high complexity is presented to demonstrate the feasibility of practical emitter fabrication using nanostructured carbon films.