Study on self-aligned contact oxide etching using C5F8∕O2∕Ar and C5F8∕O2∕Ar∕CH2F2 plasma

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2005-07, Vol.23 (4), p.953-958
Main Authors: Kim, Seung-bum, Choi, Dong-goo, Hong, Tea-eun, Park, Tae-su, Kim, Dong-sauk, Song, Yong-wook, Kim, Chang-il
Format: Article
Language:eng ; jpn
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ISSN:0734-2101
1520-8559
DOI:10.1116/1.1947797