Study on self-aligned contact oxide etching using C5F8∕O2∕Ar and C5F8∕O2∕Ar∕CH2F2 plasma

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Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2005-07, Vol.23 (4), p.953-958
Main Authors: Kim, Seung-bum, Choi, Dong-goo, Hong, Tea-eun, Park, Tae-su, Kim, Dong-sauk, Song, Yong-wook, Kim, Chang-il
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Language:eng ; jpn
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container_title Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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creator Kim, Seung-bum
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doi_str_mv 10.1116/1.1947797
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source American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)
title Study on self-aligned contact oxide etching using C5F8∕O2∕Ar and C5F8∕O2∕Ar∕CH2F2 plasma
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