Polymer molded templates for nanostructured amorphous silicon photovoltaics

Here, the authors report the fabrication of transparent polymer templates for nanostructured amorphous silicon photovoltaics using low-cost nanoimprint lithography of polydimethylsiloxane. The template contains a square two-dimensional array of high-aspect-ratio nanoholes (300 nm diameter by 1   μ m...

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2011-03, Vol.29 (2), p.021017-021017-5
Main Authors: Pei, Lei, Balls, Amy, Tippets, Cary, Abbott, Jonathan, Linford, Matthew R., Hu, Jian, Madan, Arun, Allred, David D., Vanfleet, Richard R., Davis, Robert C.
Format: Article
Language:English
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Summary:Here, the authors report the fabrication of transparent polymer templates for nanostructured amorphous silicon photovoltaics using low-cost nanoimprint lithography of polydimethylsiloxane. The template contains a square two-dimensional array of high-aspect-ratio nanoholes (300 nm diameter by 1   μ m deep holes) on a 500 × 500   nm 2 pitch. A 100 nm thick layer of a -Si:H was deposited on the template surface resulting in a periodically nanostructured film. The optical characterization of the nanopatterned film showed lower light transmission at 600-850 nm wavelengths and lower light reflection at 400-650 nm wavelengths, resulting in 20% higher optical absorbance at AM 1.5 spectral irradiance versus a nonpatterned film.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.3554720