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Effects of gallium doping on properties of a -plane ZnO films on r -plane sapphire substrates by plasma-assisted molecular beam epitaxy
The authors report on the structural, optical, and electrical properties of Ga-doped a -plane ( 11 2 ¯ 0 ) ZnO films grown by plasma-assisted molecular beam epitaxy. Ga doping level was controlled by changing the Ga cell temperatures from 350 to 470 ° C with an interval of 30 ° C . With up to Ga...
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Published in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2011-05, Vol.29 (3), p.03A111-03A111-7 |
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Main Authors: | , , , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The authors report on the structural, optical, and electrical properties of Ga-doped
a
-plane
(
11
2
¯
0
)
ZnO films grown by plasma-assisted molecular beam epitaxy. Ga doping level was controlled by changing the Ga cell temperatures from 350 to
470
°
C
with an interval of
30
°
C
. With up to Ga cell temperatures of
440
°
C
, single crystalline Ga-doped
a
-plane ZnO films were grown; however, the sample with a Ga cell temperature of
470
°
C
showed polycrystalline features. The typical striated surface morphology normally observed from undoped ZnO films disappeared with Ga doping. ZnO films doped with Ga cell temperatures up to
440
°
C
did not show a significant change in full width at half maximum (FWHM) values of
(
11
2
¯
0
)
x-ray rocking curves by doping. The smallest FWHM values were 0.433°
(
ϕ
=
90
°
)
and 0.522°
(
ϕ
=
0
°
)
for the sample with a Ga cell temperature of
350
°
C
. The polycrystalline ZnO film with excessive Ga doping at the Ga cell temperature of
470
°
C
showed significantly increased FWHM values. Hall measurements at room temperature (RT) revealed that electron concentration began to be saturated at the Ga cell temperature of
440
°
C
and electron mobility was drastically reduced at the Ga cell temperature of
470
°
C
. The carrier concentration of Ga-doped ZnO films were controlled from
7.2
×
10
18
to
3.6
×
10
20
cm
−
3
. Anisotropic electrical properties (carrier concentration and Hall mobility) were observed in measurements by the van der Pauw method depending on the direction (
c
- or
m
-direction) for the undoped sample but not observed for the doped samples. RT photoluminescence (PL) spectra from the Ga-doped single crystalline ZnO films showed dominant near band edge (NBE) emissions with negligibly deep level emission. The NBE intensity in PL spectra increases with Ga doping. |
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ISSN: | 0734-2101 1520-8559 |
DOI: | 10.1116/1.3562162 |