Atomic step patterning in nanoimprint lithography: Molecular dynamics study

Atomic-scale formability of nanoimprint lithography using an atomically stepped mold is investigated in a molecular dynamics simulation for inorganic SiO2 glass material. Fast Fourier transformation analysis of the surface height of the glass is performed to confirm the periodicity of the atomic-ste...

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Bibliographic Details
Published in:Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2011-11, Vol.29 (6), p.06FC11-06FC11-6
Main Authors: Tada, Kazuhiro, Yasuda, Masaaki, Tan, Geng, Miyake, Yumiko, Kawata, Hiroaki, Yoshimoto, Mamoru, Hirai, Yoshihiko
Format: Article
Language:English
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Summary:Atomic-scale formability of nanoimprint lithography using an atomically stepped mold is investigated in a molecular dynamics simulation for inorganic SiO2 glass material. Fast Fourier transformation analysis of the surface height of the glass is performed to confirm the periodicity of the atomic-step pattern. From the analysis, the resolution of glass nanoimprint lithography is found to be 0.2 nm for the atomically stepped mold. This theoretical resolution agrees with the experimental resolution.
ISSN:1071-1023
2166-2746
1520-8567
2166-2754
DOI:10.1116/1.3659712