Modeling of counter streaming charged beams in MICHELLE-eBEAM

• Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2013-11, Vol.31 (6), p.6
• Main Authors: Ovtchinnikov, Serguei G., Cooke, Simon J., Mkrtchyan, Masis M., Shtokhamer, Roman, Kostas, Christopher, Petillo, John J., Petric, Paul F., McCord, Mark A., Vlasov, Alexander N., Levush, Baruch
• Format: Article
• Language: English
• ISSN: 2166-2746; 1520-8567; 2166-2754
• DOI: 10.1116/1.4827189

A new approach implemented in the MICHELLE-eBEAM code [Ovtchinnikov et al., J. Vac. Sci. Technol. B 28, C6J8 (2010)] is designed to take advantage of the graphics processing unit hardware acceleration using novel algorithms to capture inter-particle interactions accurately and efficiently. This approach is used in the simulation of counter streaming charged particle beams, where two beams are colocated in space while propagating in opposite directions, and has applications in lithographic devices such as in Reflective Electron Beam Lithography (REBL) [Petric et al., J. Vac. Sci. Technol. B 27, 161 (2009)]. Modeling such counter streaming beams presents different computational challenges depending on the specific device being modeled. These applications often require the modeling of both global and stochastic space charge, where the latter calls for accurate evaluation of Coulomb interactions. In this paper, the authors report on our progress and demonstrate, for a high current REBL application, the achieved accuracy and performance of the new code.