Room-temperature growth of ZrO2 thin films using a novel hyperthermal oxygen-atom source

Thin ZrO2 films have been grown on Si(100) and on glassy carbon substrates using a novel atomic oxygen source in a standard molecular beam epitaxy system. The oxygen source produces a flux of hyperthermal oxygen atoms with an ion/atom-ratio ≪0.001 through electron stimulated desorption from a Ag all...

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 1999-01, Vol.17 (1), p.14-18
Main Authors: Wisotzki, Elmar, Balogh, Adam G., Hahn, Horst, Wolan, John T., Hoflund, Gar B.
Format: Article
Language:English
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Summary:Thin ZrO2 films have been grown on Si(100) and on glassy carbon substrates using a novel atomic oxygen source in a standard molecular beam epitaxy system. The oxygen source produces a flux of hyperthermal oxygen atoms with an ion/atom-ratio ≪0.001 through electron stimulated desorption from a Ag alloy surface at an operating pressure
ISSN:0734-2101
1520-8559
DOI:10.1116/1.581547