Selective and nonselective plasma etching of (Al0.18Ga0.82)2O3/ Ga2O3 heterostructures

The addition of CHF3 to Cl2/Ar inductively coupled plasmas operating at low dc self-biases (

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2024-03, Vol.42 (2)
Main Authors: Wan, Hsiao-Hsuan, Chiang, Chao-Ching, Li, Jian-Sian, Ren, Fan, Alema, Fikadu, Osinsky, Andrei, Pearton, Stephen J.
Format: Article
Language:English
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Description
Summary:The addition of CHF3 to Cl2/Ar inductively coupled plasmas operating at low dc self-biases (
ISSN:0734-2101
1520-8559
DOI:10.1116/6.0003400