Understanding focus effects in submicrometer optical lithography: a review

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Bibliographic Details
Published in:Optical Engineering 1993-10, Vol.32 (10), p.2350-2362
Main Author: Mack, Chris A
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0091-3286
1560-2303
DOI:10.1117/12.146837