Laser Chemical Vapor Deposition Using Continuous Wave And Pulsed Lasers

The deposition rate in laser chemical vapor deposition (LCVD) is a function of the surface temperature and therefore also a function of the chang-ing reflectivity of the surface during deposition. The influence of these parame-ters on the LCVD rate of metallic and insulating thin films was investiga...

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Bibliographic Details
Published in:Optical Engineering 1984-08, Vol.23 (4), p.234470-234470
Main Authors: Allen, S. D, Trigubo, A. B, Liu, Y. C
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:The deposition rate in laser chemical vapor deposition (LCVD) is a function of the surface temperature and therefore also a function of the chang-ing reflectivity of the surface during deposition. The influence of these parame-ters on the LCVD rate of metallic and insulating thin films was investigated using both pulsed and cw laser sources and optical monitoring of the depositing film thickness. Physical properties of the LCVD films are reported.
ISSN:0091-3286
1560-2303
DOI:10.1117/12.7973320