Features of the transport of sputtered atoms during Ta2O5 film deposition onto substrates of complicated configuration

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Bibliographic Details
Published in:Technical physics letters 2002-03, Vol.28 (3), p.173-175
Main Authors: Bystrov, Yu. A., Laska, V. L., Vol’pyas, V. A., Govako, E. A., Timofeev, D. E., Troshkov, V. V.
Format: Article
Language:English
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ISSN:1063-7850
1090-6533
DOI:10.1134/1.1467265