Kinetic model of Al oxidation by water vapor in heterogeneous plasma: Heterophase kinetics

The kinetic model of gas and heterophase plasma-chemical processes taking place in the working zone of a reactor is extended to the evaporation of aluminum from the surface of microparticles, which results in the mean value of the flux density and evaporation time. It is shown that the balance of al...

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Bibliographic Details
Published in:High temperature 2015, Vol.53 (1), p.21-26
Main Authors: Bityurin, V. A., Klimov, A. I., Korshunov, O. V., Chinnov, V. F.
Format: Article
Language:English
Subjects:
Atoms and Molecules in Strong Fields
Classical and Continuum Physics
Industrial Chemistry/Chemical Engineering
Laser Matter Interaction
Materials Science
Physical Chemistry
Physics
Physics and Astronomy
Plasma Investigations
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Summary:The kinetic model of gas and heterophase plasma-chemical processes taking place in the working zone of a reactor is extended to the evaporation of aluminum from the surface of microparticles, which results in the mean value of the flux density and evaporation time. It is shown that the balance of aluminum atoms in the working zone is determined by the heterogeneous processes of evaporation of low-melting aluminum and adhesion of refractory oxides, which is the dominant aluminum-containing component of the plasma. The time of flight of microparticles through the working zone in a gas-discharge aluminum-water reactor with a pumping system is experimentally found, which, under the conditions created, coincides with the burnout time of aluminum microparticles. The mechanisms of burnout and reproduction of microparticles (evaporation and microexplosions) are determined, reducing the average size of microparticles in the working zone from 100 to 10 μm.
ISSN:0018-151X
1608-3156
DOI:10.1134/S0018151X14060042