Manufacturing garnet ferrite film resonators using the chemical etching technique

A procedure of manufacturing microwave resonators on the basis of epitaxial Y 3 Fe 5 O 12 and (Y, Sm, Lu, Ca) 3 (Fe, Ge) 5 O 12 garnet ferrites with thicknesses of ≤5 μm, which are grown on gallium-gadolinium garnet substrates, is described. To obtain circular garnet ferrites—resonators with diamete...

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Bibliographic Details
Published in:Instruments and experimental techniques (New York) 2013-11, Vol.56 (6), p.741-744
Main Authors: Yur’ev, S. A., Yushchuk, S. I.
Format: Article
Language:English
Subjects:
Electrical Engineering
Laboratory Techniques
Measurement Science and Instrumentation
Physical Chemistry
Physics
Physics and Astronomy
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Summary:A procedure of manufacturing microwave resonators on the basis of epitaxial Y 3 Fe 5 O 12 and (Y, Sm, Lu, Ca) 3 (Fe, Ge) 5 O 12 garnet ferrites with thicknesses of ≤5 μm, which are grown on gallium-gadolinium garnet substrates, is described. To obtain circular garnet ferrites—resonators with diameters of 0.5–3.0 mm-via chemical etching in orthophosphoric acid at T = 60–175°C, protecting SiO 2 , silicon adhesive, and photoresist coatings are used. It is established that the resonators that were manufactured using a protective FP-383 photoresist coating have the narrowest ferromagnetic-resonance line.
ISSN:0020-4412
1608-3180
DOI:10.1134/S0020441213050199