Chemical Vapor Deposition of an Iridium Phase on Hafnium Carbide and Tantalum Carbide

Nanocrystalline iridium coatings on hafnium carbide and tantalum carbide substrates are prepared by chemical vapor deposition (MOCVD) at 600°С. Subsequent high-temperature treatment at 1100°С gives rise to chemical reactions between iridium and hafnium carbide or tantalum carbide to yield nanosized...

Full description

Saved in:
Bibliographic Details
Published in:Russian journal of inorganic chemistry 2020-11, Vol.65 (11), p.1781-1788
Main Authors: Lozanov, V. V., Il’in, I. Yu, Morozova, N. B., Trubin, S. V., Baklanova, N. I.
Format: Article
Language:English
Subjects:
Chemistry
Chemistry and Materials Science
Inorganic Chemistry
Inorganic Materials and Nanomaterials
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Nanocrystalline iridium coatings on hafnium carbide and tantalum carbide substrates are prepared by chemical vapor deposition (MOCVD) at 600°С. Subsequent high-temperature treatment at 1100°С gives rise to chemical reactions between iridium and hafnium carbide or tantalum carbide to yield nanosized substitutional intermetallic solid solutions MIr 3 –   x and evolve free carbon. The occurrence of intermetallic interaction is proved by X-ray photoelectron (XPS) spectroscopy.
ISSN:0036-0236
1531-8613
DOI:10.1134/S0036023620110108