Nanometer-precision contour-measurement technique for the diagnostics of multilayer nanostructures

A new technique of contour measurements with nanometer precision for the diagnostics of multilayer structures and other samples applied in optical and silicon technologies, and metal processing is proposed. This paper describes the development of two main technical solutions to achieve and verify na...

Full description

Saved in:
Bibliographic Details
Published in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2014-05, Vol.8 (3), p.456-461
Main Authors: Loginov, V. B., Troyan, V. I., Elkin, A. G., Loginov, B. A., Borisyuk, P. V., Borman, V. D., Tronin, V. N.
Format: Article
Language:English
Subjects:
Chemistry and Materials Science
Materials Science
Surfaces and Interfaces
Thin Films
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A new technique of contour measurements with nanometer precision for the diagnostics of multilayer structures and other samples applied in optical and silicon technologies, and metal processing is proposed. This paper describes the development of two main technical solutions to achieve and verify nanometer resolution of the contour measuring instrument—single-crystal-silicon guide and test plates. The use of a crystal as a linear guide gives the possibility to achieve long-term stability of its bearing surface within a few nanometers. A test sample of a multilayer structure is developed and its parameters are controlled by means of transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS) and X-ray absorption near edge spectroscopy (XANES). The results of measuring test samples with a step height of 100 and 200 nm by means of the contour measurement technique are presented.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451014030100