On the direct X-ray lithographic formation of deep microstructures

Apparatus and technological protocols developed at the Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences (BINP SB RAS), for the method of the deep X-ray lithography of high-aspect-ratio microstructures with an arbitrarily specified topological pattern are presented. T...

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Bibliographic Details
Published in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2014-11, Vol.8 (6), p.1201-1204
Main Authors: Goldenberg, B. G., Lemzyakov, A. G., Zelinsky, A. G., Pindyurin, V. F.
Format: Article
Language:English
Subjects:
Chemistry and Materials Science
Materials Science
Surfaces and Interfaces
Thin Films
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Summary:Apparatus and technological protocols developed at the Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences (BINP SB RAS), for the method of the deep X-ray lithography of high-aspect-ratio microstructures with an arbitrarily specified topological pattern are presented. The novelty of the approach described is the use of the direct formation of deep LIGA structures in a SU-8 negative photoresist with a diaphragmed SR (synchrotron radiation) microbeam with the possibility of changing the diaphragm during exposure.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451014060275