Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease...

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Bibliographic Details
Published in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2016-05, Vol.10 (3), p.648-651
Main Authors: Kashkarov, E. B., Nikitenkov, N. N., Syrtanov, M. S., Sutygina, A. N., Gvozdyakov, D. V.
Format: Article
Language:English
Subjects:
Chemistry and Materials Science
Materials Science
Surfaces and Interfaces
Thin Films
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Summary:It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451016030265