Sapphire substrates with a regular surface relief

The lithography-free technique is proposed to obtain a regular relief in the form of a regular 2D system of 25-nm protrusions on a sapphire plate surface. The use of grid masks allows one to form a regular relief on the sapphire substrates of arbitrary area. The structure of crystal films formed by...

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Bibliographic Details
Published in:Crystallography reports 2014-09, Vol.59 (5), p.732-735
Main Authors: Butashin, A. V., Kanevsky, V. M., Muslimov, A. E., Vasilyev, A. L., Emirov, Yu. N., Rakova, E. V., Golubeva, A. S., Klevachev, A. M.
Format: Article
Language:English
Subjects:
Crystallography and Scattering Methods
Physics
Physics and Astronomy
Surface and Thin Films
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Summary:The lithography-free technique is proposed to obtain a regular relief in the form of a regular 2D system of 25-nm protrusions on a sapphire plate surface. The use of grid masks allows one to form a regular relief on the sapphire substrates of arbitrary area. The structure of crystal films formed by the sputtering of metal aluminum onto sapphire substrates with subsequent oxidation and annealing is thoroughly investigated and compared with the nanostructured (0001) sapphire wafer surface in the form of regular steps up to 5 nm in height with atomically smooth terraces.
ISSN:1063-7745
1562-689X
DOI:10.1134/S1063774514050022