Properties of permalloy films produced in low-temperature plasma flows with a controlled composition

A simple version of a flow-forming plasma sputtering system is proposed. The causes that determine the properties of the deposited films are revealed when the composition, energy, and particle density of the flow are controlled. The electron component of the plasma flow and an increase in its ion co...

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Bibliographic Details
Published in:Technical physics 2009-08, Vol.54 (8), p.1228-1231
Main Authors: Aleksandrov, V. A., Veselov, A. G., Kiryasova, O. A., Serdobintsev, A. A.
Format: Article
Language:English
Subjects:
Classical and Continuum Physics
Physics
Physics and Astronomy
Short Communications
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Summary:A simple version of a flow-forming plasma sputtering system is proposed. The causes that determine the properties of the deposited films are revealed when the composition, energy, and particle density of the flow are controlled. The electron component of the plasma flow and an increase in its ion component are found to degrade the magnetic properties of the films. The ferromagnetic resonance (FMR) line half-width of 10- to 150-nm-thick films is shown to mainly depend on the energy of the neutral flow component, which is specified by the sputtering conditions at an anode voltage of 400–700 V. In this rather narrow energy range, the FMR line half-width is 25 Oe for cold substrates.
ISSN:1063-7842
1090-6525
DOI:10.1134/S1063784209080222