Mask for micropattern formation on diamond films

A new technology of forming micropatterned masks for the etching of diamond films is proposed, which makes possible high-precision lithography on the samples with areas up to 10 4 mm 2 . A minimum element size that can be achieved is only determined by the level of lithography accessible for silicon...

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Bibliographic Details
Published in:Technical physics letters 2012-03, Vol.38 (3), p.225-227
Main Authors: Belousov, M. E., Il’ichev, E. A., Kuleshov, A. E., Matveeva, N. K., Minakov, P. V., Petrukhin, G. N., Nabiev, R. M., Rychkov, G. S.
Format: Article
Language:English
Subjects:
Classical and Continuum Physics
Physics
Physics and Astronomy
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Summary:A new technology of forming micropatterned masks for the etching of diamond films is proposed, which makes possible high-precision lithography on the samples with areas up to 10 4 mm 2 . A minimum element size that can be achieved is only determined by the level of lithography accessible for silicon-based integrated circuits. The proposed technology can be used in creating unique devices, including biosensor chips for human genome decoding.
ISSN:1063-7850
1090-6533
DOI:10.1134/S1063785012030054