Direct Etching of Poly(methyl methacrylate) Using Laser Plasma Soft X-rays

We have investigated direct etching of poly(methyl methacrylate) (PMMA) using laser plasma soft X-rays. We focused soft X-rays of 6--25 nm on PMMA sheets efficiently using an Au coated ellipsoidal mirror. $7\times 10^{-2}$% of laser energy is estimated to be converted to soft X-rays that was inciden...

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Bibliographic Details
Published in:Applied physics express 2010-06, Vol.3 (6), p.066502-066502-3
Main Authors: Torii, Shuichi, Makimura, Tetsuya, Okazaki, Kouta, Nakamura, Daisuke, Takahashi, Akihiko, Okada, Tatsuo, Niino, Hiroyuki, Murakami, Kouichi
Format: Article
Language:English
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Summary:We have investigated direct etching of poly(methyl methacrylate) (PMMA) using laser plasma soft X-rays. We focused soft X-rays of 6--25 nm on PMMA sheets efficiently using an Au coated ellipsoidal mirror. $7\times 10^{-2}$% of laser energy is estimated to be converted to soft X-rays that was incident to the PMMA sheets. We found that PMMA surfaces are etched beyond a threshold power density. The energy density of absorbed soft X-rays at the threshold is 7 kJ/cm 3 . The results suggest that etching is governed by decomposition into fragments.
ISSN:1882-0778
1882-0786
DOI:10.1143/APEX.3.066502