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Annealing Behavior of Boron and Oxygen Implanted Silicon

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Bibliographic Details
Published in:	Japanese Journal of Applied Physics 1975-01, Vol.14 (10), p.1627-1628
Main Authors:	Itoh, Tadatsugu, Shinada, Kazuyoshi
Format:	Article
Language:	English
Citations:	Items that cite this one
Online Access:	Get full text
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