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Spontaneous Inclusion of Oxygen in Sputter-Deposited Amorphous Silicon during and after Fabrication

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Bibliographic Details
Published in:	Japanese Journal of Applied Physics 1980-01, Vol.19 (2), p.L65-L68
Main Authors:	Imura, Takeshi, Ushita, Katsumi, Hiraki, Akio
Format:	Article
Language:	English
Citations:	Items that cite this one
Online Access:	Get full text
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