Maskless fabrication of high quality DFB laser gratings by laser induced chemical etching

High quality submicron DFB laser gratings with 130 nm groove depth are fabricated without roughness on a grating surface by laser induced chemical etching. It is found that rigid configuration of an irradiation cell and directional etching performance of laser etching is very important to obtain hig...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1985-01, Vol.24 (5), p.L294-L296
Main Authors: AOYAGI, Y, MASUDA, S, DOI, A, NAMBA, S
Format: Article
Language:English
Subjects:
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Lasers
Optics
Physics
Semiconductor lasers
laser diodes
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Description
Summary:High quality submicron DFB laser gratings with 130 nm groove depth are fabricated without roughness on a grating surface by laser induced chemical etching. It is found that rigid configuration of an irradiation cell and directional etching performance of laser etching is very important to obtain high quality gratings.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.24.l294