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Raman scattering measurements of strains in ZnSe epitaxial films on GaAs
Raman spectroscopy has been applied to the evaluation of strains in ZnSe films grown by molecular beam epitaxy on GaAs. The observed variation of the ZnSe LO phonon frequency with thickness is explained well in terms of the conversion from the elastic strain due to accommodation of the lattice misma...
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Published in: | Japanese Journal of Applied Physics 1988-07, Vol.27 (7), p.1327-1330 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Raman spectroscopy has been applied to the evaluation of strains in ZnSe films grown by molecular beam epitaxy on GaAs. The observed variation of the ZnSe LO phonon frequency with thickness is explained well in terms of the conversion from the elastic strain due to accommodation of the lattice mismatch to the thermal strain due to the difference in thermal expansion coefficients of the substrate and epitaxial film. The strains estimated from the Raman measurements are consistent with the results obtained from X-ray analyses by other researchers. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.27.1327 |