Vibrational and Rotational Energy Distributions in a Hot Cl 2 Molecular Beam

Vibrational and rotational energy distributions of a hot Cl 2 (Cl 2 * ) molecular beam, which is used for a semiconductor device etching process, is studied by a laser-induced fluorescence method. The Cl 2 * beam is produced by free jet expansion of a Cl 2 gas heated in a quartz furnace. It is found...

Full description

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics 1989-07, Vol.28 (7R), p.1268
Main Authors: Hiraoka, Susumu, Suzuki, Keizo, Nishimatsu, Shigeru
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Vibrational and rotational energy distributions of a hot Cl 2 (Cl 2 * ) molecular beam, which is used for a semiconductor device etching process, is studied by a laser-induced fluorescence method. The Cl 2 * beam is produced by free jet expansion of a Cl 2 gas heated in a quartz furnace. It is found that the hot molecular beam is a transition flow between a continuum free jet and an effusive flow. The vibrational and rotational energy distributions can be described by Boltzmann functions of well-defined temperatures. The vibrational temperature is rather close to the furnace exit temperature, while the rotational temperature is cooled to 150–250 K during the isentropic free expansion. These results show that furnace exit temperature is crucial to the production of a highly reactive hot molecular beam of large vibrational energy.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.28.1268