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AsH 3 Cracking Characteristics in Gas Source Molecular Beam Epitaxy
A time dependence of AsH 3 cracking characteristics in gas source molecular beam epitaxy using metalorganic and hydride gases was found. AsH 3 flow for about 1 hour was needed to create a stationary state in the cracking characteristics. During this transitional time, some arsenic, decomposition pro...
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Published in: | Japanese Journal of Applied Physics 1990-12, Vol.29 (12R), p.2768 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | A time dependence of AsH
3
cracking characteristics in gas source molecular beam epitaxy using metalorganic and hydride gases was found. AsH
3
flow for about 1 hour was needed to create a stationary state in the cracking characteristics. During this transitional time, some arsenic, decomposition products of AsH
3
, was trapped in the cracking cell, and there was a limit to the amount of arsenic that was trapped. The amount of arsenic was limited by the existence of AsH
3
in the cracking zone which hindered the trapping of arsenic. The arsenic trapping might be caused by chemical reactions between arsenic and the cracking cell. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.29.2768 |