Initial boronization of JT-60U tokamak using decaborane

A decaborane-based boronization system has been installed in the JT-60U tokamak in order to reduce the influx of impurities during plasma discharges. Boronization has been performed under a glow discharge using a helium-decaborane gas mixture. The properties of the boron films deposited through boro...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1993-07, Vol.32 (7), p.3276-3281
Main Authors: SAIDOH, M, OGIWARA, N, YAGYU, J, SUGIE, T, SAKASAI, A, ASAKURA, N, YAMAGE, M, SUGAI, H, JACKSON, G. L, SHIMADA, M, ARAI, T, HIRATSUKA, H, KOIKE, T, SHIMIZU, M, NINOMIYA, H, NAKAMURA, H, JIMBOU, R
Format: Article
Language:English
Subjects:
Exact sciences and technology
Impurities in plasmas
Magnetic confinement and equilibrium
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma properties
Tokamaks
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Summary:A decaborane-based boronization system has been installed in the JT-60U tokamak in order to reduce the influx of impurities during plasma discharges. Boronization has been performed under a glow discharge using a helium-decaborane gas mixture. The properties of the boron films deposited through boronization and the effects of boronization on the tokamak discharges were investigated. It was found that the deposition of a boron layer with high purity was achieved with few impurities other than hydrogen through boronization, and that the present boronization deposited toroidally nonuniform boron film. It was also found that the decaborane-based boronization resulted in good plasma performance similar to that of conventional boronization.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.32.3276