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Performance of single sideband optical lithography using a pupil filter in replicating isolated patterns
This paper describes how oblique illumination optical lithography using a transmittance-adjusted pupil filter is efficient for isolated patterns as well as periodical patterns. This method is successful for the following reasons. When a pupil filter has a small transmittance in the area where 0th-or...
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| Published in: | Japanese Journal of Applied Physics 1994, Vol.33 (12B), p.6838-6847 |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
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| cited_by | cdi_FETCH-LOGICAL-c302t-97b455cf78eec53de1c812ed9229f6c432f1d6a55cd0ad8dd6da6cea94d7d9b53 |
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| cites | cdi_FETCH-LOGICAL-c302t-97b455cf78eec53de1c812ed9229f6c432f1d6a55cd0ad8dd6da6cea94d7d9b53 |
| container_end_page | 6847 |
| container_issue | 12B |
| container_start_page | 6838 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 33 |
| creator | HORIUCHI, T HARADA, K |
| description | This paper describes how oblique illumination optical lithography using a transmittance-adjusted
pupil filter is efficient for isolated patterns as well as periodical patterns. This
method is successful for the following reasons. When a pupil filter has a small transmittance
in the area where 0th-order diffraction light image of secondary light source is made,
the 0th-order diffraction light is selectively attenuated. From this attenuation, the
ratio of the light components with a middle and high spatial frequency becomes larger
than it would without a pupil filter. As a result, because the light intensity curves
for isolated line patterns and space patterns are sharpened, high resolution and large
focus latitude are obtained. Lines-and-spaces patterns and both types of isolated
patterns with a critical size near the resolution limit are replicated into the designed
width simultaneously with the same exposure dose. |
| doi_str_mv | 10.1143/JJAP.33.6838 |
| format | article |
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pupil filter is efficient for isolated patterns as well as periodical patterns. This
method is successful for the following reasons. When a pupil filter has a small transmittance
in the area where 0th-order diffraction light image of secondary light source is made,
the 0th-order diffraction light is selectively attenuated. From this attenuation, the
ratio of the light components with a middle and high spatial frequency becomes larger
than it would without a pupil filter. As a result, because the light intensity curves
for isolated line patterns and space patterns are sharpened, high resolution and large
focus latitude are obtained. Lines-and-spaces patterns and both types of isolated
patterns with a critical size near the resolution limit are replicated into the designed
width simultaneously with the same exposure dose.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.33.6838</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Applied sciences ; Electronics ; Exact sciences and technology ; Microelectronic fabrication (materials and surfaces technology) ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><ispartof>Japanese Journal of Applied Physics, 1994, Vol.33 (12B), p.6838-6847</ispartof><rights>1995 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c302t-97b455cf78eec53de1c812ed9229f6c432f1d6a55cd0ad8dd6da6cea94d7d9b53</citedby><cites>FETCH-LOGICAL-c302t-97b455cf78eec53de1c812ed9229f6c432f1d6a55cd0ad8dd6da6cea94d7d9b53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,4024,27923,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3428557$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>HORIUCHI, T</creatorcontrib><creatorcontrib>HARADA, K</creatorcontrib><title>Performance of single sideband optical lithography using a pupil filter in replicating isolated patterns</title><title>Japanese Journal of Applied Physics</title><description>This paper describes how oblique illumination optical lithography using a transmittance-adjusted
pupil filter is efficient for isolated patterns as well as periodical patterns. This
method is successful for the following reasons. When a pupil filter has a small transmittance
in the area where 0th-order diffraction light image of secondary light source is made,
the 0th-order diffraction light is selectively attenuated. From this attenuation, the
ratio of the light components with a middle and high spatial frequency becomes larger
than it would without a pupil filter. As a result, because the light intensity curves
for isolated line patterns and space patterns are sharpened, high resolution and large
focus latitude are obtained. Lines-and-spaces patterns and both types of isolated
patterns with a critical size near the resolution limit are replicated into the designed
width simultaneously with the same exposure dose.</description><subject>Applied sciences</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNo9kD1PwzAQhi0EEqWw8QM8MJJixx9Jxqriq6pEB5gj1z63Rm5i2e7Qf48jENOr0z13unsQuqdkQSlnT-v1crtgbCFb1l6gGWW8qTiR4hLNCKlpxbu6vkY3KX2XUgpOZ-iwhWjHeFSDBjxanNyw91DCwE4NBo8hO6089i4fxn1U4XDGpwnCCodTcB5b5zNE7AYcIfgC56nr0uhVBoODyqU9pFt0ZZVPcPeXc_T18vy5eqs2H6_vq-Wm0ozUueqaHRdC26YF0IIZoLqlNZhyeWel5qy21EhVEEOUaY2RRkkNquOmMd1OsDl6_N2r45hSBNuH6I4qnntK-slSP1nqGesnSwV_-MWDSuVPG4sIl_5nGK9bIRr2A5Mwam4</recordid><startdate>1994</startdate><enddate>1994</enddate><creator>HORIUCHI, T</creator><creator>HARADA, K</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>1994</creationdate><title>Performance of single sideband optical lithography using a pupil filter in replicating isolated patterns</title><author>HORIUCHI, T ; HARADA, K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c302t-97b455cf78eec53de1c812ed9229f6c432f1d6a55cd0ad8dd6da6cea94d7d9b53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><topic>Applied sciences</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>HORIUCHI, T</creatorcontrib><creatorcontrib>HARADA, K</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>HORIUCHI, T</au><au>HARADA, K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Performance of single sideband optical lithography using a pupil filter in replicating isolated patterns</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1994</date><risdate>1994</risdate><volume>33</volume><issue>12B</issue><spage>6838</spage><epage>6847</epage><pages>6838-6847</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>This paper describes how oblique illumination optical lithography using a transmittance-adjusted
pupil filter is efficient for isolated patterns as well as periodical patterns. This
method is successful for the following reasons. When a pupil filter has a small transmittance
in the area where 0th-order diffraction light image of secondary light source is made,
the 0th-order diffraction light is selectively attenuated. From this attenuation, the
ratio of the light components with a middle and high spatial frequency becomes larger
than it would without a pupil filter. As a result, because the light intensity curves
for isolated line patterns and space patterns are sharpened, high resolution and large
focus latitude are obtained. Lines-and-spaces patterns and both types of isolated
patterns with a critical size near the resolution limit are replicated into the designed
width simultaneously with the same exposure dose.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/JJAP.33.6838</doi><tpages>10</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-4922 |
| ispartof | Japanese Journal of Applied Physics, 1994, Vol.33 (12B), p.6838-6847 |
| issn | 0021-4922 1347-4065 |
| language | eng |
| recordid | cdi_crossref_primary_10_1143_JJAP_33_6838 |
| source | Institute of Physics IOPscience extra; Institute of Physics |
| subjects | Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| title | Performance of single sideband optical lithography using a pupil filter in replicating isolated patterns |
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